Nanofabrication and Directed Self-Assembly
As conventional fabrication technologies, such as optical lithography, develop, they begin to run up against fundamental limits. New measurement methods are needed to understand and help mitigate the effects of those limits. In addition, novel fabrication techniques are required to help extend both the lifetime and range of application of existing techniques. New measurement methods are needed for techniques such as directed self-assembly. This approach leverages existing patterning methods by combining them with self-organizing systems, such as diblock copolymers, to create manufacturing techniques that can be readily integrated into existing processes.
Directed assembly of diblock copolymers
Nanoparticle tracking for fluidic self-assembly
Smart Substrate Sensor
J. Alexander Liddle - NIST
Gila E. Stein - NIST
Matthew D. McMahon - NIST
Peter T. Carmichael - NIST
Online: December 2007
Last Updated: December 2007
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